1. Regulations
  2. title 40
  3. chapter I-i22
  4. part 98
  5. subpart I
  6. appendix-i 7

- Table I-8 to Subpart I of Part 98—Default Emission Factors (1-UN2O,j) for N2O Utilization (UN2O,j)

Table I-8 to Subpart I of Part 98—Default Emission Factors (1-UN2O,j) for N2O Utilization (UN2O,j)

Manufacturing type/process type/wafer size N2O Semiconductor Manufacturing: 200 mm or Less: CVD 1-Ui1.0 Other Manufacturing Process 1-Ui1.0 300 mm or greater: CVD 1-Ui0.5 Other Manufacturing Process 1-Ui1.0 LCD Manufacturing: CVD Thin Film Manufacturing 1-Ui0.63 All other N2O Processes1.0
[89 FR 31921, Apr. 25, 2024]

AUTHORITY: 42 U.S.C. 7401-7671q.

SOURCE: 74 FR 56374, Oct. 30, 2009, unless otherwise noted.