- Table I-12 to Subpart I of Part 98—Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for Use With the Stack Test Method

Table I-12 to Subpart I of Part 98—Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for Use With the Stack Test Method

[300 mm and 450 mm Wafers]

All processes Process gas i CF4C2F6CHF3CH2F2CH3F C3F8C3F8 Remote C4F8NF3NF3
Remote
SF6C4F6C5F8C4F8O 1-Ui0.650.800.370.200.300.300.0630.1830.190.0180.300.150.100NA BCF4NA0.210.0760.0600.0290.21NA0.0450.0400.0370.0330.0590.109NA BC2F60.058NA0.0580.0430.00930.18NA0.0270.0204NA0.0410.0620.083NA BC4F60.0083NA0.01219NA0.001NANA0.008NANANANANANA BC4F80.0046NA0.002720.0540.007NANANANANANA0.0051NANA BC3F8NANANANANANANANANANANANA0.00012NA BCH2F20.005NA0.0024NA0.0033NANA0.00210.000340.000880.0000200.000030NANA BCH3F0.0061NA0.0270.0036NA0.0007NA0.00630.00360.00280.00820.00065NANA BCHF30.012NANA0.0570.0160.012NA0.0280.01060.0000590.00390.0170.0069NA BF2NANANANANANANANANA0.50NANANANA
[89 FR 31922, Apr. 25, 2024]